標題: Recommended Methods to Study Resistive Switching Devices
作者: Lanza, Mario
Wong, H-S Philip
Pop, Eric
Ielmini, Daniele
Strukov, Dimitri
Regan, Brian C.
Larcher, Luca
Villena, Marco A.
Yang, J. Joshua
Goux, Ludovic
Belmonte, Attilio
Yang, Yuchao
Puglisi, Francesco M.
Kang, Jinfeng
Magyari-Kope, Blanka
Yalon, Eilam
Kenyon, Anthony
Buckwell, Mark
Mehonic, Adnan
Shluger, Alexander
Li, Haitong
Hou, Tuo-Hung
Hudec, Boris
Akinwande, Deji
Ge, Ruijing
Ambrogio, Stefano
Roldan, Juan B.
Miranda, Enrique
Sune, Jordi
Pey, Kin Leong
Wu, Xing
Raghavan, Nagarajan
Wu, Ernest
Lu, Wei D.
Navarro, Gabriele
Zhang, Weidong
Wu, Huaqiang
Li, Runwei
Holleitner, Alexander
Wurstbauer, Ursula
Lemme, Max C.
Liu, Ming
Long, Shibing
Liu, Qi
Lv, Hangbing
Padovani, Andrea
Pavan, Paolo
Valov, Ilia
Jing, Xu
Han, Tingting
Zhu, Kaichen
Chen, Shaochuan
Hui, Fei
Shi, Yuanyuan
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: electrical characterization;electronic synapses;nanofabrication;resistive random-access memories;resistive switching
公開日期: 1-Jan-2019
摘要: Resistive switching (RS) is an interesting property shown by some materials systems that, especially during the last decade, has gained a lot of interest for the fabrication of electronic devices, with electronic nonvolatile memories being those that have received the most attention. The presence and quality of the RS phenomenon in a materials system can be studied using different prototype cells, performing different experiments, displaying different figures of merit, and developing different computational analyses. Therefore, the real usefulness and impact of the findings presented in each study for the RS technology will be also different. This manuscript describes the most recommendable methodologies for the fabrication, characterization, and simulation of RS devices, as well as the proper methods to display the data obtained. The idea is to help the scientific community to evaluate the real usefulness and impact of an RS study for the development of RS technology.
URI: http://dx.doi.org/10.1002/aelm.201800143
http://hdl.handle.net/11536/148696
ISSN: 2199-160X
DOI: 10.1002/aelm.201800143
期刊: ADVANCED ELECTRONIC MATERIALS
Volume: 5
Appears in Collections:Articles