標題: | Recommended Methods to Study Resistive Switching Devices |
作者: | Lanza, Mario Wong, H-S Philip Pop, Eric Ielmini, Daniele Strukov, Dimitri Regan, Brian C. Larcher, Luca Villena, Marco A. Yang, J. Joshua Goux, Ludovic Belmonte, Attilio Yang, Yuchao Puglisi, Francesco M. Kang, Jinfeng Magyari-Kope, Blanka Yalon, Eilam Kenyon, Anthony Buckwell, Mark Mehonic, Adnan Shluger, Alexander Li, Haitong Hou, Tuo-Hung Hudec, Boris Akinwande, Deji Ge, Ruijing Ambrogio, Stefano Roldan, Juan B. Miranda, Enrique Sune, Jordi Pey, Kin Leong Wu, Xing Raghavan, Nagarajan Wu, Ernest Lu, Wei D. Navarro, Gabriele Zhang, Weidong Wu, Huaqiang Li, Runwei Holleitner, Alexander Wurstbauer, Ursula Lemme, Max C. Liu, Ming Long, Shibing Liu, Qi Lv, Hangbing Padovani, Andrea Pavan, Paolo Valov, Ilia Jing, Xu Han, Tingting Zhu, Kaichen Chen, Shaochuan Hui, Fei Shi, Yuanyuan 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | electrical characterization;electronic synapses;nanofabrication;resistive random-access memories;resistive switching |
公開日期: | 1-Jan-2019 |
摘要: | Resistive switching (RS) is an interesting property shown by some materials systems that, especially during the last decade, has gained a lot of interest for the fabrication of electronic devices, with electronic nonvolatile memories being those that have received the most attention. The presence and quality of the RS phenomenon in a materials system can be studied using different prototype cells, performing different experiments, displaying different figures of merit, and developing different computational analyses. Therefore, the real usefulness and impact of the findings presented in each study for the RS technology will be also different. This manuscript describes the most recommendable methodologies for the fabrication, characterization, and simulation of RS devices, as well as the proper methods to display the data obtained. The idea is to help the scientific community to evaluate the real usefulness and impact of an RS study for the development of RS technology. |
URI: | http://dx.doi.org/10.1002/aelm.201800143 http://hdl.handle.net/11536/148696 |
ISSN: | 2199-160X |
DOI: | 10.1002/aelm.201800143 |
期刊: | ADVANCED ELECTRONIC MATERIALS |
Volume: | 5 |
Appears in Collections: | Articles |