完整後設資料紀錄
DC 欄位語言
dc.contributor.authorTsai, CTen_US
dc.contributor.authorChuu, DSen_US
dc.contributor.authorChen, GLen_US
dc.contributor.authorYang, SLen_US
dc.date.accessioned2019-04-02T05:59:11Z-
dc.date.available2019-04-02T05:59:11Z-
dc.date.issued1996-06-15en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.362645en_US
dc.identifier.urihttp://hdl.handle.net/11536/149219-
dc.description.abstractCdS thin films with various grain sizes were produced by rf sputtering and in situ postannealing processes. For a series of annealing time intervals, the average grain sizes of an as-deposited thin film with thickness similar to 4000 Angstrom were found to vary from similar to 280 to similar to 1500 Angstrom. Three bands located in the green, yellow, and red regions were observed in photoluminescence (PL) spectra of these as-deposited films. The temperature dependence of (PL) spectra of CdS microcrystals was investigated. The variations of the (PL) spectra with average grain size and thickness of CdS thin films were also studied. It was found that the intensity of the yellow band was increased as increasing the film thickness while the intensity of the red band was decreased as the grain size of the film became larger. The peak positions of the yellow and red bands were found to be blue-shifted as the films became thinner. (C) 1996 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleStudies of grain size effects in rf sputtered CdS thin filmsen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.362645en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume79en_US
dc.citation.spage9105en_US
dc.citation.epage9109en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:A1996UT34100034en_US
dc.citation.woscount114en_US
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