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dc.contributor.authorCheng, C. H.en_US
dc.contributor.authorDeng, C. K.en_US
dc.contributor.authorHsu, H. H.en_US
dc.contributor.authorChen, P. C.en_US
dc.contributor.authorLiou, B. H.en_US
dc.contributor.authorChin, Alberten_US
dc.contributor.authorYeh, F. S.en_US
dc.date.accessioned2019-04-02T05:57:53Z-
dc.date.available2019-04-02T05:57:53Z-
dc.date.issued2010-01-01en_US
dc.identifier.issn0013-4651en_US
dc.identifier.urihttp://dx.doi.org/10.1149/1.3439668en_US
dc.identifier.urihttp://hdl.handle.net/11536/149985-
dc.description.abstractWe proposed two lanthanide-oxide mixed TiO2 dielectrics for metal-insulator-metal (MIM) capacitors using TiO2-LaAlO (TLAO) and TiO2-LaYO (TLYO) dielectrics. For the TLAO dielectric, a high capacitance density of 24 fF/mu m(2) with a low leakage current of 1.4 x 10(-7) A/cm(2) was obtained. The LaYO and TLYO dielectrics showed very low leakage densities of 4.18 and 6.89 fA/pF V at -1 V, respectively, which satisfied the International Technology Roadmap for Semiconductors' (ITRS) goal of <7 fA/pF V for precision analog capacitors. Although the capacitance-voltage nonlinearities were not yet good enough to satisfy the ITRS requirements, the MIM capacitors have shown improved electrical properties. Therefore, we suggested that the TiO2 dielectrics with the introduction of LaAlO3 and LaYO might be promising for MIM capacitors. (C) 2010 The Electrochemical Society. [DOI: 10.1149/1.3439668] All rights reserved.en_US
dc.language.isoen_USen_US
dc.titleLanthanide-Oxides Mixed TiO2 Dielectrics for High-kappa MIM Capacitorsen_US
dc.typeArticleen_US
dc.identifier.doi10.1149/1.3439668en_US
dc.identifier.journalJOURNAL OF THE ELECTROCHEMICAL SOCIETYen_US
dc.citation.volume157en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000279673400062en_US
dc.citation.woscount3en_US
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