| Title: | High-kappa Ir/TiTaO/TaN capacitors suitable for analog IC applications |
| Authors: | Chiang, KC Huang, CC Chin, A Chen, WJ McAlister, SP Chiu, HF Chen, JR Chi, CC 奈米科技中心 Center for Nanoscience and Technology |
| Keywords: | TiTaO;Ir;MIM;analog;ITRS |
| Issue Date: | 1-Jul-2005 |
| Abstract: | We have developed novel high-k Ir/TiTaO/TaN capacitors which have high-capacitance density (10.3 fF/mu m(2)), small leakage current at 2 V (1.2 x 10(-8) A/cm(2)), and low voltage linearity of the capacitance (89 ppm/V-2). These excellent results meet the TTRS roadmap requirements for precision -analog capacitors for the year 2018. The good performance is due to the very high K (45) achieved in the TiTaO dielectric and the high work-function (5.2 eV) provided by the Ir electrode. |
| URI: | http://dx.doi.org/10.1109/LED.2005.851241 http://hdl.handle.net/11536/13535 |
| ISSN: | 0741-3106 |
| DOI: | 10.1109/LED.2005.851241 |
| Journal: | IEEE ELECTRON DEVICE LETTERS |
| Volume: | 26 |
| Issue: | 7 |
| Begin Page: | 504 |
| End Page: | 506 |
| Appears in Collections: | Articles |
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- Very high kappa and high density TiTaO MIM capacitors for analog and RF applications / Chiang, KC;Chin, A;Lai, CH;Chen, WJ;Cheng, CF
- Very high-density (23 fF/mu m(2)) RF MIM capacitors using high-k TaTiO as the dielectric / Chiang, KC;Lai, CH;Chin, A;Wang, TJ;Chiu, HF
- High-performance SrTiO3 MIM capacitors for analog applications / Chiang, K. C.;Huang, Ching-Chien;Chen, G. L.;Chen, Wen Jauh;Kao, H. L.
- High-Performance Metal-Insulator-Metal Capacitor Using Quality Properties of High-kappa TiPrO Dielectric / Huang, Chingchien;Cheng, Chun-Hu;Lee, Ko-Tao;Liou, Bo-Heng
- Improved high-temperature leakage in high-density MIM capacitors by using a TiLaO dielectric and an Ir electrode / Cheng, C. H.;Pan, H. C.;Yang, H. J.;Hsiao, C. N.;Chou, C. P.
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