標題: | A Tight Binding Method Study of Optimized Si-SiO2 System |
作者: | Watanabe, Hiroshi Kawabata, Kenji Ichikawa, Takashi 電子工程學系及電子研究所 電子與資訊研究中心 Department of Electronics Engineering and Institute of Electronics Microelectronics and Information Systems Research Center |
關鍵字: | Band gap;density-of-states ( DOS);interfacial states;molecular dynamics;Si dot;SiO2;tight binding |
公開日期: | 1-十一月-2010 |
摘要: | A mixed method of molecular dynamics and tight binding is applied to a Si-cluster surrounded by SiO2 in order to study an influence of interfacial states on the band structure of the Si cluster. As a result, it is found that intrinsic interfacial states invade the band gaps of Si and SiO2 from the conduction band, which may suggest that the Si dot surrounded by SiO2 sounds metallic due to the interfacial states. This feature occurs while the size of the Si dot is less than at least 4 nm. |
URI: | http://dx.doi.org/10.1109/TED.2010.2071150 http://hdl.handle.net/11536/150110 |
ISSN: | 0018-9383 |
DOI: | 10.1109/TED.2010.2071150 |
期刊: | IEEE TRANSACTIONS ON ELECTRON DEVICES |
Volume: | 57 |
起始頁: | 3084 |
結束頁: | 3091 |
顯示於類別: | 期刊論文 |