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dc.contributor.authorChen, Wei-Tsungen_US
dc.contributor.authorZan, Hsiao-Wenen_US
dc.date.accessioned2014-12-08T15:21:10Z-
dc.date.available2014-12-08T15:21:10Z-
dc.date.issued2012-01-01en_US
dc.identifier.issn0741-3106en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LED.2011.2171316en_US
dc.identifier.urihttp://hdl.handle.net/11536/15022-
dc.description.abstractA light-erasable memory and a real-time ultraviolet (UV) detector were developed from an amorphous indium-gallium-zinc-oxide (IGZO) thin-film transistor fabricated at room temperature without post-annealing. The natural defects within the IGZO or at the dielectric interface serve as electron traps to support a writing operation (switching down the channel conductance). A negative gate bias accompanied by UV illumination performs an erasing operation (switching up the channel conductance). After the writing/erasing of the proposed memory, an on/off ratio greater than 10(4) was maintained for a testing duration of 10 000 s. A real-time UV detector was also developed, and a light/dark ratio of roughly 10(4) was demonstrated.en_US
dc.language.isoen_USen_US
dc.subjectIndium-gallium-zinc-oxide (IGZO)en_US
dc.subjectmemoryen_US
dc.subjectphotodetector and room temperatureen_US
dc.titleHigh-Performance Light-Erasable Memory and Real-Time Ultraviolet Detector Based on Unannealed Indium-Gallium-Zinc-Oxide Thin-Film Transistoren_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LED.2011.2171316en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.citation.volume33en_US
dc.citation.issue1en_US
dc.citation.spage77en_US
dc.citation.epage79en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of Displayen_US
dc.identifier.wosnumberWOS:000298380300025-
dc.citation.woscount12-
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