Title: | Light Enhancement of Silicon-Nanocrystal-Embedded SiOx Film on Silicon-on-Insulator Substrate |
Authors: | Chen, Cheng-Chang Lin, Yung-Hsaing Shih, M. H. Lin, Gong-Ru Kuo, Hao-Chung 光電工程學系 光電工程研究所 Department of Photonics Institute of EO Enginerring |
Issue Date: | 1-Apr-2011 |
Abstract: | We reported the light enhancement from a silicon-nanocrystal-embedded SiOx film on a silicon-on-insulator (SOI) substrate in the visible light range. The light emission from the annealed SiOx film is one order stronger than the emission from a nonannealed SiOx film. Compared with the SiOx film on a Si substrate, two-fold enhancement in light emission from the SiOx film on a SOI substrate was also observed. The enhancement was attributed to better vertical confinement of optical field in the SiOx film on a SOI substrate. (C) 2011 The Japan Society of Applied Physics |
URI: | http://dx.doi.org/10.1143/JJAP.50.04DJ09 http://hdl.handle.net/11536/150285 |
ISSN: | 0021-4922 |
DOI: | 10.1143/JJAP.50.04DJ09 |
Journal: | JAPANESE JOURNAL OF APPLIED PHYSICS |
Volume: | 50 |
Appears in Collections: | Articles |