標題: Light Enhancement of Silicon-Nanocrystal-Embedded SiOx Film on Silicon-on-Insulator Substrate
作者: Chen, Cheng-Chang
Lin, Yung-Hsaing
Shih, M. H.
Lin, Gong-Ru
Kuo, Hao-Chung
光電工程學系
光電工程研究所
Department of Photonics
Institute of EO Enginerring
公開日期: 1-Apr-2011
摘要: We reported the light enhancement from a silicon-nanocrystal-embedded SiOx film on a silicon-on-insulator (SOI) substrate in the visible light range. The light emission from the annealed SiOx film is one order stronger than the emission from a nonannealed SiOx film. Compared with the SiOx film on a Si substrate, two-fold enhancement in light emission from the SiOx film on a SOI substrate was also observed. The enhancement was attributed to better vertical confinement of optical field in the SiOx film on a SOI substrate. (C) 2011 The Japan Society of Applied Physics
URI: http://dx.doi.org/10.1143/JJAP.50.04DJ09
http://hdl.handle.net/11536/150285
ISSN: 0021-4922
DOI: 10.1143/JJAP.50.04DJ09
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS
Volume: 50
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