標題: Iridium Nanocrystal Thin-Film Transistor Nonvolatile Memory with Si3N4/SiO2 Stack of Asymmetric Tunnel Barrier
作者: Wang, Terry Tai-Jui
Lu, Tien-Lin
Wu, Chien-Hung
Liu, Yu-Cheng
Hung, Shih-Wei
Hsieh, Ing-Jar
Kuo, Cheng-Tzu
材料科學與工程學系
Department of Materials Science and Engineering
公開日期: 1-May-2011
摘要: Iridium nanocrystals (Ir-NCs) lying on the Si3N4/SiO2 tunneling layer have been demonstrated and Ir-NC-assisted thin-film transistor nonvolatile memory devices were successfully developed. Results show that Ir-NCs with a number density of similar to 6 x 10(11) cm(-2) and a particle diameter of 4 to 12 nm can successfully be fabricated as charge trapping centers. Owing to the asymmetric SiO2/Si3N4 tunneling layer that increases programming/erasing efficiency, a significant memory window of 5.5 V has potential to be applied to multibit memory devices. Furthermore, after 10(4) s, the memory window is still about 4.0 V in logic states. (C) 2011 The Japan Society of Applied Physics
URI: http://dx.doi.org/10.1143/JJAP.50.05EF03
http://hdl.handle.net/11536/150310
ISSN: 0021-4922
DOI: 10.1143/JJAP.50.05EF03
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS
Volume: 50
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