標題: Nitric Acid Oxidized ZrO2 as the Tunneling Oxide of Cobalt Silicide Nanocrystal Memory Devices
作者: Hu, Chih-Wei
Chang, Ting-Chang
Tu, Chun-Hao
Chen, Yang-Dong
Lin, Chao-Cheng
Chen, Min-Chen
Lin, Jian-Yang
Sze, Simon M.
Tseng, Tseung-Yuen
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: Cobalt silicide;nanocrystal;nitric acid oxidation;nonvolatile memory;ZrO2
公開日期: 1-Sep-2011
摘要: In this study, ZrO2 formed by the nitric acid oxidation method is proposed to be the tunneling oxide for nonvolatile memory device applications. The sputtered Zr thin film was oxidized by immersing in the nitric acid solution (HNO3:H2O = 1:10) for 60 s at room temperature. The quality of the formed ZrO2 was also extracted by the capacitance-voltage and current density-voltage measurements. Then, X-ray photoelectron spectroscopy has been used to confirm that the deposited Zr can be oxidized completely after the oxidation process. Moreover, a CoSi2 thin film was deposited on the nitric acid oxidized ZrO2 as the self-assembled layer of the memory device. After the device fabrication, the electrical and material characteristics of the CoSi2 nanocrystal memory devices have also been demonstrated and discussed.
URI: http://dx.doi.org/10.1109/TNANO.2010.2095466
http://hdl.handle.net/11536/150368
ISSN: 1536-125X
DOI: 10.1109/TNANO.2010.2095466
期刊: IEEE TRANSACTIONS ON NANOTECHNOLOGY
Volume: 10
起始頁: 1031
結束頁: 1035
Appears in Collections:Articles