完整後設資料紀錄
DC 欄位語言
dc.contributor.authorChen, Bo-Yuanen_US
dc.contributor.authorChen, Kun-Mingen_US
dc.contributor.authorShiao, Yu-Shao Jerryen_US
dc.contributor.authorLin, Chuang-Juen_US
dc.contributor.authorHuang, Guo-Weien_US
dc.contributor.authorChen, Hsiu-Chihen_US
dc.contributor.authorHsueh, Fu-Kuoen_US
dc.contributor.authorShen, Chang-Hongen_US
dc.contributor.authorShieh, Jia-Minen_US
dc.contributor.authorChang, Edward Yien_US
dc.date.accessioned2019-05-02T00:25:49Z-
dc.date.available2019-05-02T00:25:49Z-
dc.date.issued2019-04-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.7567/1347-4065/ab02e1en_US
dc.identifier.urihttp://hdl.handle.net/11536/151578-
dc.description.abstractIn this paper, we present the dc and high-frequency characteristics of trigate polycrystalline-silicon (poly-Si) thin-film transistors (TFTs) for RF applications. Trigate TFTs were fabricated using a 3D-IC process and designed with a multi-finger gate and multi-channel configuration. To obtain an optimal device design guideline, different source/drain (S/D) extension dimensions and channel layouts are investigated. We find that devices with a shorter or wider extension have higher cutoff frequencies (f(T)) and maximum oscillation frequencies (f(max)) owing to their lower S/D resistances. In addition, the high-frequency performance can be further improved by adopting the tapered channel structure, where the channel width increases gradually from the source to the drain. For the optimal device designs, the values of f(T) and f(max) are around 25 GHz and 30 GHz, respectively. The high f(T) and f(m)(ax) as well as excellent gate controllability in our devices indicate the trigate poly-Si TFT could be a suitable candidate for low-cost RFIC applications. (C) 2019 The Japan Society of Applied Physicsen_US
dc.language.isoen_USen_US
dc.titleDC and high-frequency characteristics of trigate polycrystalline-silicon thin-film transistors with different layout geometriesen_US
dc.typeArticleen_US
dc.identifier.doi10.7567/1347-4065/ab02e1en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume58en_US
dc.citation.issueSBen_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000464309900119en_US
dc.citation.woscount0en_US
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