完整後設資料紀錄
DC 欄位語言
dc.contributor.authorLin, Che-Yien_US
dc.contributor.authorChen, Chao-Fuen_US
dc.contributor.authorChang, Yuan-Mingen_US
dc.contributor.authorYang, Shih-Hsienen_US
dc.contributor.authorLee, Ko-Chunen_US
dc.contributor.authorWu, Wen-Weien_US
dc.contributor.authorJian, Wen-Binen_US
dc.contributor.authorLin, Yen-Fuen_US
dc.date.accessioned2019-08-02T02:15:35Z-
dc.date.available2019-08-02T02:15:35Z-
dc.date.issued1970-01-01en_US
dc.identifier.issn1613-6810en_US
dc.identifier.urihttp://dx.doi.org/10.1002/smll.201900865en_US
dc.identifier.urihttp://hdl.handle.net/11536/152249-
dc.description.abstractElectrical contacts often dominate charge transport properties at the nanoscale because of considerable differences in nanoelectronic device interfaces arising from unique geometric and electrostatic features. Transistors with a tunable Schottky barrier between the metal and semiconductor interface might simplify circuit design. Here, germanium nanowire (Ge NW) transistors with Cu3Ge as source/drain contacts formed by both buffered oxide etching treatments and rapid thermal annealing are reported. The transistors based on this Cu3Ge/Ge/Cu3Ge heterostructure show ambipolar transistor behavior with a large on/off current ratio of more than 10(5) and 10(3) for the hole and electron regimes at room temperature, respectively. Investigations of temperature-dependent transport properties and low-frequency current fluctuations reveal that the tunable effective Schottky barriers of the Ge NW transistors accounted for the ambipolar behaviors. It is further shown that this ambipolarity can be used to realize binary-signal and data-storage functions, which greatly simplify circuit design compared with conventional technologies.en_US
dc.language.isoen_USen_US
dc.subjectgermanium nanowiresen_US
dc.subjectlogic circuitsen_US
dc.subjectlow-frequency noiseen_US
dc.subjectSchottky barrieren_US
dc.subjecttransistorsen_US
dc.titleA Triode Device with a Gate Controllable Schottky Barrier: Germanium Nanowire Transistors and Their Applicationsen_US
dc.typeArticleen_US
dc.identifier.doi10.1002/smll.201900865en_US
dc.identifier.journalSMALLen_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000474152100001en_US
dc.citation.woscount0en_US
顯示於類別:期刊論文