Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Wu, W. T. | en_US |
dc.contributor.author | Hsieh, H. C. | en_US |
dc.contributor.author | Chen, Y. L. | en_US |
dc.contributor.author | Chang, W. Y. | en_US |
dc.contributor.author | Su, D. C. | en_US |
dc.date.accessioned | 2014-12-08T15:21:24Z | - |
dc.date.available | 2014-12-08T15:21:24Z | - |
dc.date.issued | 2010 | en_US |
dc.identifier.isbn | 978-0-8194-8263-1 | en_US |
dc.identifier.issn | 0277-786X | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/15224 | - |
dc.identifier.uri | http://dx.doi.org/10.1117/12.860356 | en_US |
dc.description.abstract | A simple method for measuring a step-height sample is presented with the heterodyne central fringe identification technique and a precision translation stage. This method can accurately point out the zero optical path difference position such that the optical path lengths of two arms of the interferometer are absolutely equivalent. Thus, the two surfaces of the step-height sample can be identified sequentially with the translation stage. The displacement of the translation stage is equal to the step-height of the test sample. The feasibility of the technique is demonstrated. The measurable range is not limited by the coherence length of the light source. The measurement accuracy depends on the uncertainties of the heterodyne central fringe identification method and the translation stage. In our setup, we have a 100 mm measurable range and a 4 nm uncertainty. The wavelength stability of the light source has a minor effect on the measurement. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | central fringe | en_US |
dc.subject | heterodyne interferometry | en_US |
dc.subject | electro-optic modulator | en_US |
dc.subject | tunable laser | en_US |
dc.subject | translation stage | en_US |
dc.subject | step-height | en_US |
dc.title | Step Height Measurement by Using Heterodyne Central Fringe Identification Technique | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1117/12.860356 | en_US |
dc.identifier.journal | INSTRUMENTATION, METROLOGY, AND STANDARDS FOR NANOMANUFACTURING IV | en_US |
dc.citation.volume | 7767 | en_US |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | Department of Photonics | en_US |
dc.identifier.wosnumber | WOS:000285828500008 | - |
Appears in Collections: | Conferences Paper |
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