Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Shen, Chih-Chiang | en_US |
dc.contributor.author | Hsu, Tsung-Chi | en_US |
dc.contributor.author | Yeh, Yen-Wei | en_US |
dc.contributor.author | Kang, Chieh-Yu | en_US |
dc.contributor.author | Lu, Yun-Ting | en_US |
dc.contributor.author | Lin, Hon-Way | en_US |
dc.contributor.author | Tseng, Hsien-Yao | en_US |
dc.contributor.author | Chen, Yu-Tzu | en_US |
dc.contributor.author | Chen, Cheng-Yuan | en_US |
dc.contributor.author | Lin, Chien-Chung | en_US |
dc.contributor.author | Wu, Chao-Hsin | en_US |
dc.contributor.author | Lee, Po-Tsung | en_US |
dc.contributor.author | Sheng, Yang | en_US |
dc.contributor.author | Chiu, Ching-Hsueh | en_US |
dc.contributor.author | Kuo, Hao-Chung | en_US |
dc.date.accessioned | 2019-09-02T07:46:14Z | - |
dc.date.available | 2019-09-02T07:46:14Z | - |
dc.date.issued | 2019-08-14 | en_US |
dc.identifier.issn | 1931-7573 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1186/s11671-019-3107-7 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/152631 | - |
dc.description.abstract | We have studied the characteristics of frequency response at 850-nm GaAs high-speed vertical-cavity surface-emitting lasers (VCSELs) with different kinds of oxide aperture sizes and cavity length using the PICS3D simulation program. Using 5-mu m oxide aperture sizes, the frequency response behavior can be improved from 18.4 GHz and 15.5 GHz to 21.2 GHz and 19 GHz in a maximum of 3 dB at 25 degrees C and 85 degrees C, respectively. Numerical simulation results also suggest that the frequency response performances improved from 21.2 GHz and 19 GHz to 30.5 GHz and 24.5 GHz in a maximum of 3 dB at 25 degrees C and 85 degrees C due to the reduction of cavity length from 3 lambda/2 to lambda/2. Consequently, the high-speed VCSEL devices were fabricated on a modified structure and exhibited 50-Gb/s data rate at 85 degrees C. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | High-speed VCSEL | en_US |
dc.subject | PICS3D | en_US |
dc.subject | 50 Gb | en_US |
dc.subject | s | en_US |
dc.subject | Oxide aperture | en_US |
dc.subject | Cavity length | en_US |
dc.title | Design, Modeling, and Fabrication of High-Speed VCSEL with Data Rate up to 50 Gb/s | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1186/s11671-019-3107-7 | en_US |
dc.identifier.journal | NANOSCALE RESEARCH LETTERS | en_US |
dc.citation.volume | 14 | en_US |
dc.citation.issue | 1 | en_US |
dc.citation.spage | 0 | en_US |
dc.citation.epage | 0 | en_US |
dc.contributor.department | 交大名義發表 | zh_TW |
dc.contributor.department | 光電系統研究所 | zh_TW |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | National Chiao Tung University | en_US |
dc.contributor.department | Institute of Photonic System | en_US |
dc.contributor.department | Department of Photonics | en_US |
dc.identifier.wosnumber | WOS:000480812800002 | en_US |
dc.citation.woscount | 0 | en_US |
Appears in Collections: | Articles |