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dc.contributor.authorShen, Chih-Chiangen_US
dc.contributor.authorHsu, Tsung-Chien_US
dc.contributor.authorYeh, Yen-Weien_US
dc.contributor.authorKang, Chieh-Yuen_US
dc.contributor.authorLu, Yun-Tingen_US
dc.contributor.authorLin, Hon-Wayen_US
dc.contributor.authorTseng, Hsien-Yaoen_US
dc.contributor.authorChen, Yu-Tzuen_US
dc.contributor.authorChen, Cheng-Yuanen_US
dc.contributor.authorLin, Chien-Chungen_US
dc.contributor.authorWu, Chao-Hsinen_US
dc.contributor.authorLee, Po-Tsungen_US
dc.contributor.authorSheng, Yangen_US
dc.contributor.authorChiu, Ching-Hsuehen_US
dc.contributor.authorKuo, Hao-Chungen_US
dc.date.accessioned2019-09-02T07:46:14Z-
dc.date.available2019-09-02T07:46:14Z-
dc.date.issued2019-08-14en_US
dc.identifier.issn1931-7573en_US
dc.identifier.urihttp://dx.doi.org/10.1186/s11671-019-3107-7en_US
dc.identifier.urihttp://hdl.handle.net/11536/152631-
dc.description.abstractWe have studied the characteristics of frequency response at 850-nm GaAs high-speed vertical-cavity surface-emitting lasers (VCSELs) with different kinds of oxide aperture sizes and cavity length using the PICS3D simulation program. Using 5-mu m oxide aperture sizes, the frequency response behavior can be improved from 18.4 GHz and 15.5 GHz to 21.2 GHz and 19 GHz in a maximum of 3 dB at 25 degrees C and 85 degrees C, respectively. Numerical simulation results also suggest that the frequency response performances improved from 21.2 GHz and 19 GHz to 30.5 GHz and 24.5 GHz in a maximum of 3 dB at 25 degrees C and 85 degrees C due to the reduction of cavity length from 3 lambda/2 to lambda/2. Consequently, the high-speed VCSEL devices were fabricated on a modified structure and exhibited 50-Gb/s data rate at 85 degrees C.en_US
dc.language.isoen_USen_US
dc.subjectHigh-speed VCSELen_US
dc.subjectPICS3Den_US
dc.subject50 Gben_US
dc.subjectsen_US
dc.subjectOxide apertureen_US
dc.subjectCavity lengthen_US
dc.titleDesign, Modeling, and Fabrication of High-Speed VCSEL with Data Rate up to 50 Gb/sen_US
dc.typeArticleen_US
dc.identifier.doi10.1186/s11671-019-3107-7en_US
dc.identifier.journalNANOSCALE RESEARCH LETTERSen_US
dc.citation.volume14en_US
dc.citation.issue1en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department光電系統研究所zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentInstitute of Photonic Systemen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000480812800002en_US
dc.citation.woscount0en_US
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