標題: Abnormal High Resistive State Current Mechanism Transformation in Ti/HfO2/TiN Resistive Random Access Memory
作者: Zhou, Kuan-Ju
Chang, Ting-Chang
Lin, Chih-Yang
Chen, Chun-Kuei
Tseng, Yi-Ting
Zheng, Hao-Xuan
Chen, Hong-Chih
Sun, Li-Chuan
Lien, Chih-Ying
Tan, Yung-Fang
Wu, Chung-Wei
Yeh, Yu-Hsuan
Sze, Simon M.
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: Titanium;Hafnium oxide;Schottky thermal emission;hopping conduction
公開日期: 1-二月-2020
摘要: In this letter, the electrical characteristics of Ti/HfO2/TiN resistive random access memory (RRAM) were thoroughly investigated. An abnormal current degradation was seen in the DC sweeping cycle. Both the on-state and off-state current clearly exhibited degradation with time. Next, current fitting analysis was used to investigate the carrier transport mechanisms. The results indicate that the on-state carrier transport mechanism changed from space-charge-limited current into hopping conduction after cycle sweeping. However, the off-state current changes from Schottky thermal emission to hopping conduction. Based on comparisons of different Schottky distances and Schottky barriers, physical models were proposed to explain the abnormal current degradation behavior. Finally, COMSOL electric field simulations were used to show the electric field distribution around the conducting filament (CF), and the conducting model was subsequently verified.
URI: http://dx.doi.org/10.1109/LED.2019.2961408
http://hdl.handle.net/11536/153808
ISSN: 0741-3106
DOI: 10.1109/LED.2019.2961408
期刊: IEEE ELECTRON DEVICE LETTERS
Volume: 41
Issue: 2
起始頁: 224
結束頁: 227
顯示於類別:期刊論文