標題: | Investigation of Inversion Charge Characteristics and Inversion Charge Loss for InGaAs Negative-Capacitance Double-Gate FinFETs Considering Quantum Capacitance |
作者: | Huang, Shih-En Lin, Shih-Han Su, Pin 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | Negative-capacitance FET (NCFET);quantum capacitance;FinFET structure;CMOS;InGaAs |
公開日期: | 1-一月-2020 |
摘要: | This paper investigates the inversion charge characteristics and quantum-capacitance induced inversion charge loss for In0.53Ga0.47As negative-capacitance FinFETs (NC-FinFETs) using theoretical calculation corroborated with numerical simulation. Our study indicates that, the boost of inversion charges due to negative capacitance increases with increasing remnant polarization P-r. In addition, the inversioncharge boosting for the In0.53Ga0.47As device is significantly larger than that of the Si (110) device due to the step-like inversion capacitance characteristic stemming from the 2D density-of-states of the In0.53Ga0.47As device. In other words, the quantum-capacitance induced inversion-charge loss for III-V channel can be mitigated in NCFETs. |
URI: | http://dx.doi.org/10.1109/JEDS.2020.2966642 http://hdl.handle.net/11536/153825 |
ISSN: | 2168-6734 |
DOI: | 10.1109/JEDS.2020.2966642 |
期刊: | IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY |
Volume: | 8 |
Issue: | 1 |
起始頁: | 105 |
結束頁: | 109 |
顯示於類別: | 期刊論文 |