標題: Investigation of Inversion Charge Characteristics and Inversion Charge Loss for InGaAs Negative-Capacitance Double-Gate FinFETs Considering Quantum Capacitance
作者: Huang, Shih-En
Lin, Shih-Han
Su, Pin
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: Negative-capacitance FET (NCFET);quantum capacitance;FinFET structure;CMOS;InGaAs
公開日期: 1-一月-2020
摘要: This paper investigates the inversion charge characteristics and quantum-capacitance induced inversion charge loss for In0.53Ga0.47As negative-capacitance FinFETs (NC-FinFETs) using theoretical calculation corroborated with numerical simulation. Our study indicates that, the boost of inversion charges due to negative capacitance increases with increasing remnant polarization P-r. In addition, the inversioncharge boosting for the In0.53Ga0.47As device is significantly larger than that of the Si (110) device due to the step-like inversion capacitance characteristic stemming from the 2D density-of-states of the In0.53Ga0.47As device. In other words, the quantum-capacitance induced inversion-charge loss for III-V channel can be mitigated in NCFETs.
URI: http://dx.doi.org/10.1109/JEDS.2020.2966642
http://hdl.handle.net/11536/153825
ISSN: 2168-6734
DOI: 10.1109/JEDS.2020.2966642
期刊: IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY
Volume: 8
Issue: 1
起始頁: 105
結束頁: 109
顯示於類別:期刊論文