標題: Polydopamine and Its Composite Film as an Adhesion Layer for Cu Electroless Deposition on SiO2
作者: Chou, Shih-Cheng
Chung, Wei-An
Fan, Tzu-Ling
Dordi, Yezdi
Koike, Junichi
Wu, Pu-Wei
材料科學與工程學系
Department of Materials Science and Engineering
公開日期: 9-Mar-2020
摘要: We explore dopamine (DA) and its mixtures with polyethylene glycol (PEG) or polyethylenimine (PEI) as an adhesion layer for bonding between Cu and SiO2. The DA is oxidized to form polydopamine (PDA) which deposits as aggregates on SiO2 surface with notable surface roughness. After mixing with PEG or PEI, the morphology of PDA aggregates is altered considerably. Electroless Cu deposition in a mild alkaline bath is employed to deposit Cu atop the adhesion layer. The Cu films reveal an fcc lattice with (111) preferred orientation and their thickness was around 650 nm. From measurements of four-point probe, breaking strength, and tape-peeling tests, the PDA/PEG mixture reveals impressive performance serving as a strong adhesive for robust Cu bonding. We attribute the unique adhesive ability of PDA/PEG to the hydrogen bonds established between the catechol and amine groups of DA with PEG that renders desirable film formation on the SiO2 surface for optimized interaction between Cu and SiO2. (C) 2020 The Author(s). Published on behalf of The Electrochemical Society by IOP Publishing Limited.
URI: http://dx.doi.org/10.1149/1945-7111/ab7aa2
http://hdl.handle.net/11536/153890
ISSN: 0013-4651
DOI: 10.1149/1945-7111/ab7aa2
期刊: JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume: 167
Issue: 4
起始頁: 0
結束頁: 0
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