標題: High-Performance TiN/Al2O3/ZnO/Al2O3/TiN Flexible RRAM Device With High Bending Condition
作者: Kumar, Dayanand
Chand, Umesh
Siang, Lew Wen
Tseng, Tseung-Yuen
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: Conductive filament (CF);Gibbs free energy;Poole-Frenkel conduction;resistive switching (RS)
公開日期: 1-Feb-2020
摘要: The bipolar resistive switching (RS) characteristics of the ZnO-based TiN/Al2O3/ZnO/Al2O3/TiN structure are investigated for flexible nonvolatile memory applications. Using a thin Al2O3 buffer layer on both sides of the ZnO device shows uniform and eminently stable bipolar resistance switching characteristics. The device exhibits good RS with more than two orders of resistance ON-OFF ratio, retention of 10(4) s at 120 C, good dc endurance 10(4) cycles, and high ac endurance of 10(8) cycles with 40-ns pulsewidth without any degradation. The device shows high mechanical stability when under 10(4) continuous repetitive flexible bendings, indicating that high endurance with a very small bending radius of up to 3 mm. The lower Gibbs free energy of the Al2O3 (-1676 kJ/mol) film compared with the ZnO (-320.4 kJ/mol) and TiO2 (-994 kJ/mol) films can improve the RS properties of the TiN/Al2O3/ZnO/Al2O3/TiN device. The significant improvement in the TiN/Al2O3/ZnO/Al2O3/TiN device is due to the reason that thin Al2O3 layers on both sides of ZnO would help stabilize the local oxygen migrations for the formation and rupture of the conductive filament during the continuous switching cycles, resulting in high memory switching characteristics.
URI: http://dx.doi.org/10.1109/TED.2019.2959883
http://hdl.handle.net/11536/153932
ISSN: 0018-9383
DOI: 10.1109/TED.2019.2959883
期刊: IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume: 67
Issue: 2
起始頁: 493
結束頁: 498
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