標題: | Tensile Properties and Thermal Stability of Unidirectionally < 111 >-Oriented Nanotwinned and < 110 >-Oriented Microtwinned Copper |
作者: | Li, Yu-Jin Tu, King-Ning Chen, Chih 材料科學與工程學系 國際半導體學院 Department of Materials Science and Engineering International College of Semiconductor Technology |
關鍵字: | nano-twinned Cu;toughness;thermal stability;electroplated Cu |
公開日期: | 1-三月-2020 |
摘要: | Tensile tests on two kinds of electroplated copper foils with twins before and after annealing were performed. One electroplating parameter results in a microstructure of <110>-oriented microtwinned Cu (mt-Cu), and the other is <111>-oriented nanotwinned Cu (nt-Cu). The latter shows higher thermal stability than the former after annealing. Though the toughness for the two as-plated foils are quite close, the toughness for the <111> oriented nt-Cu increased from 34 to 74 MJ/m(3) after annealing at 250 degrees C for 3 h. In comparison, the toughness of the <110>-oriented mt-Cu remained almost the same after annealing. |
URI: | http://dx.doi.org/10.3390/ma13051211 http://hdl.handle.net/11536/154085 |
DOI: | 10.3390/ma13051211 |
期刊: | MATERIALS |
Volume: | 13 |
Issue: | 5 |
起始頁: | 0 |
結束頁: | 0 |
顯示於類別: | 期刊論文 |