Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Shie, Kai Cheng | en_US |
| dc.contributor.author | Juang, Jing-Ye | en_US |
| dc.contributor.author | Chen, Chih | en_US |
| dc.date.accessioned | 2020-05-05T00:02:23Z | - |
| dc.date.available | 2020-05-05T00:02:23Z | - |
| dc.date.issued | 2020-02-01 | en_US |
| dc.identifier.issn | 0021-4922 | en_US |
| dc.identifier.uri | http://dx.doi.org/10.7567/1347-4065/ab5697 | en_US |
| dc.identifier.uri | http://hdl.handle.net/11536/154196 | - |
| dc.description.abstract | Cu-to-Cu direct bonding was successfully achieved in 10 s with < 111 >-oriented nanotwinned Cu (nt-Cu) bumps in ambient N-2. The bonding temperature and pressure were 300 degrees C and 90 MPa, respectively. A nearly void-free interface and a low bump resistance of 4.9 m Omega can be observed after a short-time bonding process. Besides, longer bonding times of 60 s and 30 s were employed, but the resistances of the Cu joints did not decrease significantly when the bonding time increased to 60 s. However, the nt-Cu columnar grains started to recrystallize during the 60 s bonding and started detwinning in 10 s bonding. Yet, the bonding interface remained under such a short bonding time. (C) 2019 The Japan Society of Applied Physics | en_US |
| dc.language.iso | en_US | en_US |
| dc.title | Instant Cu-to-Cu direct bonding enabled by < 111 >-oriented nanotwinned Cu bumps | en_US |
| dc.type | Article | en_US |
| dc.identifier.doi | 10.7567/1347-4065/ab5697 | en_US |
| dc.identifier.journal | JAPANESE JOURNAL OF APPLIED PHYSICS | en_US |
| dc.citation.volume | 59 | en_US |
| dc.citation.spage | 0 | en_US |
| dc.citation.epage | 0 | en_US |
| dc.contributor.department | 材料科學與工程學系 | zh_TW |
| dc.contributor.department | Department of Materials Science and Engineering | en_US |
| dc.identifier.wosnumber | WOS:000520010700004 | en_US |
| dc.citation.woscount | 0 | en_US |
| Appears in Collections: | Articles | |

