完整後設資料紀錄
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dc.contributor.authorLiu, Cheng-Weien_US
dc.contributor.authorDai, Jin-Jien_US
dc.contributor.authorWu, Ssu-Kuanen_US
dc.contributor.authorNhu-Quynh Diepen_US
dc.contributor.authorSa-Hoang Huynhen_US
dc.contributor.authorMai, Thi-Thuen_US
dc.contributor.authorWen, Hua-Chiangen_US
dc.contributor.authorYuan, Chi-Tsuen_US
dc.contributor.authorChou, Wu-Chingen_US
dc.contributor.authorShen, Ji-Linen_US
dc.contributor.authorHuy-Hoang Lucen_US
dc.date.accessioned2020-10-05T02:01:03Z-
dc.date.available2020-10-05T02:01:03Z-
dc.date.issued2020-07-31en_US
dc.identifier.issn2045-2322en_US
dc.identifier.urihttp://dx.doi.org/10.1038/s41598-020-69946-4en_US
dc.identifier.urihttp://hdl.handle.net/11536/155091-
dc.description.abstractTwo-dimensional (2D) layered GaSe films were grown on GaAs (001), GaN/Sapphire, and Mica substrates by molecular beam epitaxy (MBE). The in situ reflective high-energy electron diffraction monitoring reveals randomly in-plane orientations of nucleated GaSe layers grown on hexagonal GaN/Sapphire and Mica substrates, whereas single-orientation GaSe domain is predominant in the GaSe/GaAs (001) sample. Strong red-shifts in the frequency of in-plane E2g2 vibration modes and bound exciton emissions observed from Raman scattering and photoluminescence spectra in all samples are attributed to the unintentionally biaxial in-plane tensile strains, induced by the dissimilarity of symmetrical surface structure between the 2D-GaSe layers and the substrates during the epitaxial growth. The results in this study provide an important understanding of the MBE-growth process of 2D-GaSe on 2D/3D hybrid-heterostructures and pave the way in strain engineering and optical manipulation of 2D layered GaSe materials for novel optoelectronic integrated technologies.en_US
dc.language.isoen_USen_US
dc.titleSubstrate-induced strain in 2D layered GaSe materials grown by molecular beam epitaxyen_US
dc.typeArticleen_US
dc.identifier.doi10.1038/s41598-020-69946-4en_US
dc.identifier.journalSCIENTIFIC REPORTSen_US
dc.citation.volume10en_US
dc.citation.issue1en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000556413400020en_US
dc.citation.woscount0en_US
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