完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Liu, Cheng-Wei | en_US |
dc.contributor.author | Dai, Jin-Ji | en_US |
dc.contributor.author | Wu, Ssu-Kuan | en_US |
dc.contributor.author | Nhu-Quynh Diep | en_US |
dc.contributor.author | Sa-Hoang Huynh | en_US |
dc.contributor.author | Mai, Thi-Thu | en_US |
dc.contributor.author | Wen, Hua-Chiang | en_US |
dc.contributor.author | Yuan, Chi-Tsu | en_US |
dc.contributor.author | Chou, Wu-Ching | en_US |
dc.contributor.author | Shen, Ji-Lin | en_US |
dc.contributor.author | Huy-Hoang Luc | en_US |
dc.date.accessioned | 2020-10-05T02:01:03Z | - |
dc.date.available | 2020-10-05T02:01:03Z | - |
dc.date.issued | 2020-07-31 | en_US |
dc.identifier.issn | 2045-2322 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1038/s41598-020-69946-4 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/155091 | - |
dc.description.abstract | Two-dimensional (2D) layered GaSe films were grown on GaAs (001), GaN/Sapphire, and Mica substrates by molecular beam epitaxy (MBE). The in situ reflective high-energy electron diffraction monitoring reveals randomly in-plane orientations of nucleated GaSe layers grown on hexagonal GaN/Sapphire and Mica substrates, whereas single-orientation GaSe domain is predominant in the GaSe/GaAs (001) sample. Strong red-shifts in the frequency of in-plane E2g2 vibration modes and bound exciton emissions observed from Raman scattering and photoluminescence spectra in all samples are attributed to the unintentionally biaxial in-plane tensile strains, induced by the dissimilarity of symmetrical surface structure between the 2D-GaSe layers and the substrates during the epitaxial growth. The results in this study provide an important understanding of the MBE-growth process of 2D-GaSe on 2D/3D hybrid-heterostructures and pave the way in strain engineering and optical manipulation of 2D layered GaSe materials for novel optoelectronic integrated technologies. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Substrate-induced strain in 2D layered GaSe materials grown by molecular beam epitaxy | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1038/s41598-020-69946-4 | en_US |
dc.identifier.journal | SCIENTIFIC REPORTS | en_US |
dc.citation.volume | 10 | en_US |
dc.citation.issue | 1 | en_US |
dc.citation.spage | 0 | en_US |
dc.citation.epage | 0 | en_US |
dc.contributor.department | 電子物理學系 | zh_TW |
dc.contributor.department | Department of Electrophysics | en_US |
dc.identifier.wosnumber | WOS:000556413400020 | en_US |
dc.citation.woscount | 0 | en_US |
顯示於類別: | 期刊論文 |