標題: | Impact of electrode thermal conductivity on high resistance state level in HfO2-based RRAM |
作者: | Lin, Shih-Kai Wu, Cheng-Hsien Chen, Min-Chen Chang, Ting-Chang Lien, Chen-Hsin Xu, You-Lin Tseng, Yi-Ting Wu, Pei-Yu Tan, Yung-Fang Sun, Li-Chuan Zhang, Yong-Ci Huang, Jen-Wei Sze, Simon M. 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | resistance random access memory (RRAM);reset behavior;thermal conductivity;oxygen ions;switching region |
公開日期: | 23-九月-2020 |
摘要: | This study examines the influence of different electrode thermal conductivity on switching behavior during the reset process. Electrical analysis methods and an analysis of current conduction mechanism indicate that better thermal conductivity in the electrode will require larger input power in order to induce more active oxygen ions to take part in the reset process. More active oxygen ions result in a more oxidized switching layer, and cause the effective switching gap (d(sw)) to become larger in the reset process. The effect of the electrode thermal conductivity and input power are explained by our model and clarified by electrical analysis methods. |
URI: | http://dx.doi.org/10.1088/1361-6463/ab92c5 http://hdl.handle.net/11536/155163 |
ISSN: | 0022-3727 |
DOI: | 10.1088/1361-6463/ab92c5 |
期刊: | JOURNAL OF PHYSICS D-APPLIED PHYSICS |
Volume: | 53 |
Issue: | 39 |
起始頁: | 0 |
結束頁: | 0 |
顯示於類別: | 期刊論文 |