完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Lee, WI | en_US |
dc.date.accessioned | 2014-12-08T15:03:00Z | - |
dc.date.available | 2014-12-08T15:03:00Z | - |
dc.date.issued | 1995-12-18 | en_US |
dc.identifier.issn | 0003-6951 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1063/1.115372 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/1593 | - |
dc.description.abstract | Wide bandwidth AlAs/Al0.6Ga0.4As tandem Bragg reflectors were grown by organometallic vapor phase epitaxy. Quarter-wave reflector stacks designed for different wavelengths were placed in cascade in epitaxially grown structures to expand the high reflectance bands. Intermediate low-index layers were put in between every two stacks to suppress the transmission peaks in the centers of the combined high reflectance bands. While a single-stack structure showed a full width half-maximum bandwidth of 500 Angstrom, the two-stack and the three-stack structures effectively doubled and tripled this bandwidth to approximately 1000 and 1500 Angstrom, respectively. (C) 1995 American Institute of Physics. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Wide bandwidth AlAs/AlGaAs tandem Bragg reflectors grown by organometallic vapor phase epitaxy | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1063/1.115372 | en_US |
dc.identifier.journal | APPLIED PHYSICS LETTERS | en_US |
dc.citation.volume | 67 | en_US |
dc.citation.issue | 25 | en_US |
dc.citation.spage | 3753 | en_US |
dc.citation.epage | 3755 | en_US |
dc.contributor.department | 交大名義發表 | zh_TW |
dc.contributor.department | 電子物理學系 | zh_TW |
dc.contributor.department | National Chiao Tung University | en_US |
dc.contributor.department | Department of Electrophysics | en_US |
dc.identifier.wosnumber | WOS:A1995TK75900028 | - |
dc.citation.woscount | 4 | - |
顯示於類別: | 期刊論文 |