完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Pearn, WL | en_US |
dc.contributor.author | Chen, KS | en_US |
dc.date.accessioned | 2014-12-08T15:01:16Z | - |
dc.date.available | 2014-12-08T15:01:16Z | - |
dc.date.issued | 1997-12-01 | en_US |
dc.identifier.issn | 0026-2714 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/161 | - |
dc.description.abstract | Process capability indices C-p(u, v), which include the four basic indices C-p, C-pk, C-pm and C-pmk as special cases, have been proposed to measure process potential and performance. C-p(u,v) are appropriate indices for processes with normal distributions, but have been shown to be inappropriate for processes with non-normal distributions. In this paper, we first consider two generalizations of C-p(u, v), which we refer to as C-Np(u, v) and C-Np(u, v), to cover cases where the underlying distributions may not be normal. Comparisons between C-Np(u, v) and C-Np'(u, v) are provided. The results indicated that the generalizations C-Np(u, v) are superior to C-Np'(u, v) in measuring process capability. We then present a case study on an aluminum electrolytic-capacitor manufacturing process to illustrate how the generalizations C-Np(u, v) may be applied to actual data collected from the factories. (C) 1997 Elsevier Science Ltd. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Capability indices for non-normal distributions with an application in electrolytic capacitor manufacturing | en_US |
dc.type | Article | en_US |
dc.identifier.journal | MICROELECTRONICS AND RELIABILITY | en_US |
dc.citation.volume | 37 | en_US |
dc.citation.issue | 12 | en_US |
dc.citation.spage | 1853 | en_US |
dc.citation.epage | 1858 | en_US |
dc.contributor.department | 工業工程與管理學系 | zh_TW |
dc.contributor.department | Department of Industrial Engineering and Management | en_US |
dc.identifier.wosnumber | WOS:A1997YJ55000009 | - |
dc.citation.woscount | 24 | - |
顯示於類別: | 期刊論文 |