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dc.contributor.authorTsai, Yu-Tingen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorLin, Chao-Chengen_US
dc.contributor.authorChiang, Lan-Shinen_US
dc.contributor.authorChen, Shih-Chengen_US
dc.contributor.authorSze, Simon M.en_US
dc.contributor.authorTseng, Tseung-Yuenen_US
dc.date.accessioned2014-12-08T15:23:05Z-
dc.date.available2014-12-08T15:23:05Z-
dc.date.issued2011en_US
dc.identifier.isbn978-1-60768-257-8en_US
dc.identifier.issn1938-5862en_US
dc.identifier.urihttp://hdl.handle.net/11536/16236-
dc.description.abstractThe influence of top electrode material on the resistive switching properties of MnO2-based memory film using Pt as a bottom electrode was investigated in this study. In comparison with Pt/MnO2/Pt and Al/ MnO2/Pt devices, the Ti/ MnO2/Pt device exhibits resistive switching current-voltage (I-V) curve, which can be traced and reproduced more than 10(5) times only showing a little decrease of resistance ratio between high and low resistance states. Furthermore, transmission electron microscopy analyses are used to confirm the crystalline structure of MnO2 on Pt bottom electrode. Secondary ion mass spectrometry reveals a change of oxygen distribution in MnO2 thin film due to material characteristic of variant top electrodes. We suggest that the interface between MnO2 and electrodes play an important role on the resistive switching behaviors.en_US
dc.language.isoen_USen_US
dc.titleEffect of Top Electrode Material on Resistive Switching Characteristics in MnO2 Nonvolatile Memory Devicesen_US
dc.typeProceedings Paperen_US
dc.identifier.journalPHYSICS AND TECHNOLOGY OF HIGH-K MATERIALS 9en_US
dc.citation.volume41en_US
dc.citation.issue3en_US
dc.citation.epage475en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000304670400050-
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