Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Chen, WK | en_US |
dc.contributor.author | Ou, J | en_US |
dc.date.accessioned | 2014-12-08T15:03:03Z | - |
dc.date.available | 2014-12-08T15:03:03Z | - |
dc.date.issued | 1995-12-01 | en_US |
dc.identifier.issn | 0021-4922 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/1640 | - |
dc.description.abstract | AlAs1-xSbx epilayers were grown on InP (100) substrates using the metalorganic chemical vapor epitaxial growth technique. Experimental results demonstrate that the solid concentration of AlAsSb is more naturally expressed as a function of the input As/Al partial pressure ratio, and not of the V/III ratio or the Sb mole fraction in group V used during the growth. In fact, the AlAs solid concentration and the input partial pressure ratio of As to Al are proportional to each other. According to the phase diagram described above, the controllability of the solid concentration of AlAsSb could be improved. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | AlAsSb | en_US |
dc.subject | MOCVD | en_US |
dc.subject | solid composition | en_US |
dc.title | Influence of As/Al and Sb/Al gas flow ratios on growth of AlAs1-xSbx alloys | en_US |
dc.type | Article | en_US |
dc.identifier.journal | JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | en_US |
dc.citation.volume | 34 | en_US |
dc.citation.issue | 12A | en_US |
dc.citation.spage | L1581 | en_US |
dc.citation.epage | L1583 | en_US |
dc.contributor.department | 交大名義發表 | zh_TW |
dc.contributor.department | 電子物理學系 | zh_TW |
dc.contributor.department | National Chiao Tung University | en_US |
dc.contributor.department | Department of Electrophysics | en_US |
dc.identifier.wosnumber | WOS:A1995TL31700003 | - |
dc.citation.woscount | 3 | - |
Appears in Collections: | Articles |