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dc.contributor.authorChen, WKen_US
dc.contributor.authorOu, Jen_US
dc.date.accessioned2014-12-08T15:03:03Z-
dc.date.available2014-12-08T15:03:03Z-
dc.date.issued1995-12-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://hdl.handle.net/11536/1640-
dc.description.abstractAlAs1-xSbx epilayers were grown on InP (100) substrates using the metalorganic chemical vapor epitaxial growth technique. Experimental results demonstrate that the solid concentration of AlAsSb is more naturally expressed as a function of the input As/Al partial pressure ratio, and not of the V/III ratio or the Sb mole fraction in group V used during the growth. In fact, the AlAs solid concentration and the input partial pressure ratio of As to Al are proportional to each other. According to the phase diagram described above, the controllability of the solid concentration of AlAsSb could be improved.en_US
dc.language.isoen_USen_US
dc.subjectAlAsSben_US
dc.subjectMOCVDen_US
dc.subjectsolid compositionen_US
dc.titleInfluence of As/Al and Sb/Al gas flow ratios on growth of AlAs1-xSbx alloysen_US
dc.typeArticleen_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERSen_US
dc.citation.volume34en_US
dc.citation.issue12Aen_US
dc.citation.spageL1581en_US
dc.citation.epageL1583en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:A1995TL31700003-
dc.citation.woscount3-
Appears in Collections:Articles