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dc.contributor.authorJen, Ko-Rueyen_US
dc.contributor.authorKim, Sung-Oen_US
dc.contributor.authorChen, Kuang-Langen_US
dc.contributor.authorChen, Samuelen_US
dc.contributor.authorLee, Chien-Pangen_US
dc.contributor.authorHuang, Chih-Mingen_US
dc.contributor.authorHsu, Chien-Hsingen_US
dc.date.accessioned2014-12-08T15:24:59Z-
dc.date.available2014-12-08T15:24:59Z-
dc.date.issued2006en_US
dc.identifier.issn1738-7558en_US
dc.identifier.urihttp://hdl.handle.net/11536/17365-
dc.description.abstractThe panels were fabricated to characterize the contamination of Magnesium Oxide (MgO) thin films by phosphors and ion bombardments in AC-PDPs. Forty-six inch WVGA panels of the surface and vertical discharge type were manufactured. The experiment was designed to investigate the relationship between the MgO thin films and phosphor contamination caused by ion bombardments in a plasma environment to produce a time lest. The contamination of MgO thin films by phosphors was investigated by way of X-ray photoelectron spectroscopy (XPS).en_US
dc.language.isoen_USen_US
dc.titleContaminations of MgO Thin Films by Phosphors for the Surface and Vertical Discharge Type AC-PDPen_US
dc.typeProceedings Paperen_US
dc.identifier.journalIMID/IDMC 2006: THE 6TH INTERNATIONAL MEETING ON INFORMATION DISPLAY/THE 5TH INTERNATIONAL DISPLAY MANUFACTURING CONFERENCE, DIGEST OF TECHNICAL PAPERSen_US
dc.citation.spage18en_US
dc.citation.epage20en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000259669300003-
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