Micro-Plasma Device Utilizing SU-8 Photoresist as a Barrier Rib

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	Jhuo, Long-Cai	en_US
dc.contributor.author	Kim, Sung-O	en_US
dc.date.accessioned	2014-12-08T15:24:59Z	-
dc.date.available	2014-12-08T15:24:59Z	-
dc.date.issued	2006	en_US
dc.identifier.issn	1738-7558	en_US
dc.identifier.uri	http://hdl.handle.net/11536/17366	-
dc.description.abstract	A newly designed micro-plasma device using SU-8 photoresist as a barrier rib has been successfully fabricated and characterized. Operating in neon gas at pressure from 300 to 800 Torr and having hexagonal structure, 5x5 arrays of micro-plasma device have been investigated. The driving voltaged is lower than 250 V.	en_US
dc.language.iso	en_US	en_US
dc.title	Micro-Plasma Device Utilizing SU-8 Photoresist as a Barrier Rib	en_US
dc.type	Proceedings Paper	en_US
dc.identifier.journal	IMID/IDMC 2006: THE 6TH INTERNATIONAL MEETING ON INFORMATION DISPLAY/THE 5TH INTERNATIONAL DISPLAY MANUFACTURING CONFERENCE, DIGEST OF TECHNICAL PAPERS	en_US
dc.citation.spage	21	en_US
dc.citation.epage	23	en_US
dc.contributor.department	光電工程學系	zh_TW
dc.contributor.department	Department of Photonics	en_US
dc.identifier.wosnumber	WOS:000259669300004	-
顯示於類別：	會議論文