標題: ELLIPSOMETRIC MEASUREMENTS AND ITS ALIGNMENT - USING THE INTENSITY RATIO TECHNIQUE
作者: CHAO, YF
WEI, CS
LEE, WC
LIN, SC
CHAO, TS
交大名義發表
National Chiao Tung University
關鍵字: ELLIPSOMETRY;POLARIMETRY;REFRACTIVE INDEX;THIN FILM
公開日期: 1-九月-1995
摘要: Using first-order treatment on azimuth errors of the polarizer (P) and analyzer (A) with respect to the plane of incidence (POI), we construct two intensity ratios around a certain configuration: such as P = +/- pi/4 and A = 0 as compared to A = pi/2. These expressions can be used not only to align the azimuths of the polarizer and analyzer to the POI, hut also to obtain the ellipsometric parameter phi without locating the minimum intensity, BK7 glass and SiO2/Si thin film are ultilized to evaluate this technique.
URI: http://dx.doi.org/10.1143/JJAP.34.5016
http://hdl.handle.net/11536/1764
ISSN: 0021-4922
DOI: 10.1143/JJAP.34.5016
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
Volume: 34
Issue: 9A
起始頁: 5016
結束頁: 5019
顯示於類別:期刊論文


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