標題: Transient-induced latchup in CMOS technology: Physical mechanism and device simulation
作者: Ker, MD
Hsu, SF
電機學院
College of Electrical and Computer Engineering
公開日期: 2004
摘要: The physical mechanism of (t) under bar ransient-induced (l) under bar atch (u) under barp (TLU) in CMOS ICs has been clearly characterized by device simulation and experimental verification in time domain perspective. An underdamped sine-wave-like voltage has been clarified as the real TLU-triggering stimulus under system-level (e) under bar lectro (s) under bar tatic (d) under bar ischarge (ESD) test. The specific "sweep-back" current caused by the minority carriers stored within the pnpn structure of CMOS ICs has been qualitatively proved to be the major cause of TLU.
URI: http://hdl.handle.net/11536/18127
ISBN: 0-7803-8684-1
期刊: IEEE INTERNATIONAL ELECTRON DEVICES MEETING 2004, TECHNICAL DIGEST
起始頁: 937
結束頁: 940
顯示於類別:會議論文