標題: | Fault detection and isolation for plasma etching using model-based approach |
作者: | Cheng, MH Huan-Shin, L Lin, SY Liu, CH Lee, WY Tsai, CH 電控工程研究所 Institute of Electrical and Control Engineering |
關鍵字: | fault detection and isolation;plasma etching;system identification;fuzzy inference;Dempster-Shafer technique |
公開日期: | 2003 |
摘要: | A fault detection and isolation system using model-based approach for the chamber pressure of plasma etching is developed. The dynamics of chamber pressure is modeled as a linear multiple-input-single-output closed-loop system and the model parameters are extracted by the system identification technique. The obtained parameters are then converted to physically meaningful features for detecting and isolating faults. The fuzzy inference and Dempster-Shafer evidence combining techniques are employed to detect and isolate fault from the features. The system has been evaluated by the measured data that are collected via SECS-II from the employed Lam-490 plasma etcher for processing practical products. The test results are satisfactory for a large amount of practical data and extensive computer simulations. |
URI: | http://hdl.handle.net/11536/18432 |
ISBN: | 0-7803-7673-0 |
ISSN: | 1078-8743 |
期刊: | ASCMC 2003: IEEE/SEMI (R) ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE AND WORKSHOP, PROCEEDINGS |
起始頁: | 208 |
結束頁: | 214 |
顯示於類別: | 會議論文 |