標題: Fault detection and isolation for plasma etching using model-based approach
作者: Cheng, MH
Huan-Shin, L
Lin, SY
Liu, CH
Lee, WY
Tsai, CH
電控工程研究所
Institute of Electrical and Control Engineering
關鍵字: fault detection and isolation;plasma etching;system identification;fuzzy inference;Dempster-Shafer technique
公開日期: 2003
摘要: A fault detection and isolation system using model-based approach for the chamber pressure of plasma etching is developed. The dynamics of chamber pressure is modeled as a linear multiple-input-single-output closed-loop system and the model parameters are extracted by the system identification technique. The obtained parameters are then converted to physically meaningful features for detecting and isolating faults. The fuzzy inference and Dempster-Shafer evidence combining techniques are employed to detect and isolate fault from the features. The system has been evaluated by the measured data that are collected via SECS-II from the employed Lam-490 plasma etcher for processing practical products. The test results are satisfactory for a large amount of practical data and extensive computer simulations.
URI: http://hdl.handle.net/11536/18432
ISBN: 0-7803-7673-0
ISSN: 1078-8743
期刊: ASCMC 2003: IEEE/SEMI (R) ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE AND WORKSHOP, PROCEEDINGS
起始頁: 208
結束頁: 214
Appears in Collections:Conferences Paper