標題: | Novel electrostatic discharge protection design for nanoelectronics in nanoscale CMOS technology |
作者: | Ker, MD Tseng, TK 電機學院 College of Electrical and Computer Engineering |
關鍵字: | electrostatic discharge (ESD);already-on device;threshold voltage;gate oxide;negative voltage generator |
公開日期: | 2003 |
摘要: | A novel electrostatic discharge (ESD) protection concept by using the already-on device is proposed to effectively protect CMOS integrated circuits (IC) in nanoscale CMOS processes against ESD stress. Such an already-on NMOS device is designed to have a threshold voltage of similar to0V, or even negative. When the IC is under the ESD zapping conditions, such already-on NMOS in CMOS IC are initially standing in the turn-on state and ready to discharge ESD current during any ESD zapping. So, such already-on NMOS has the fastest turn-on speed and the lowest trigger-on voltage to effectively protect the internal circuits with a much thinner gate oxide (similar to15Angstrom) in future sub-100nm CMOS technology. To keep such already-on devices off when the IC is under normal circuit operating condition, an onchip negative voltage generator realized by the diodes and capacitors is used to bias the gates of such already-on devices. The proposed already-on device and the on-chip negative voltage generator are fully process-compatible to the general sub-100nm CMOS processes. |
URI: | http://hdl.handle.net/11536/18721 |
ISBN: | 0-7803-7976-4 |
期刊: | 2003 THIRD IEEE CONFERENCE ON NANOTECHNOLOGY, VOLS ONE AND TWO, PROCEEDINGS |
起始頁: | 737 |
結束頁: | 740 |
顯示於類別: | 會議論文 |