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dc.contributor.authorKer, MDen_US
dc.contributor.authorChuang, CHen_US
dc.date.accessioned2014-12-08T15:26:45Z-
dc.date.available2014-12-08T15:26:45Z-
dc.date.issued2001en_US
dc.identifier.isbn0-7803-6675-1en_US
dc.identifier.urihttp://hdl.handle.net/11536/19014-
dc.language.isoen_USen_US
dc.titleESD implantations in 0.18-mu m salicided CMOS technology for on-chip ESD protection with layout considerationen_US
dc.typeProceedings Paperen_US
dc.identifier.journalPROCEEDINGS OF THE 2001 8TH INTERNATIONAL SYMPOSIUM ON THE PHYSICAL & FAILURE ANALYSIS OF INTEGRATED CIRCUITSen_US
dc.citation.spage85en_US
dc.citation.epage90en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000171369600012-
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