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學術出版;;Publications
期刊論文;;Articles
EFFECTS OF PRESSURE ON THE FORMATION OF PHOSPHORUS-DOPED MICROCRYSTALLINE SILICON FILMS DEPOSITED BY RADIO-FREQUENCY GLOW-DISCHARGE
EFFECTS OF PRESSURE ON THE FORMATION OF PHOSPHORUS-DOPED MICROCRYSTALLINE SILICON FILMS DEPOSITED BY RADIO-FREQUENCY GLOW-DISCHARGE
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Date
1995-05-01
Authors
FENG, MS
LIANG, CW
Journal Title
Journal ISSN
Volume Title
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DOI
10.1063/1.359413
Abstract
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URI
http://dx.doi.org/10.1063/1.359413
https://ir.lib.nycu.edu.tw/handle/11536/1933
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