標題: EFFECTS OF PRESSURE ON THE FORMATION OF PHOSPHORUS-DOPED MICROCRYSTALLINE SILICON FILMS DEPOSITED BY RADIO-FREQUENCY GLOW-DISCHARGE
作者: FENG, MS
LIANG, CW
材料科學與工程學系
電子工程學系及電子研究所
奈米中心
Department of Materials Science and Engineering
Department of Electronics Engineering and Institute of Electronics
Nano Facility Center
公開日期: 1-May-1995
URI: http://dx.doi.org/10.1063/1.359413
http://hdl.handle.net/11536/1933
ISSN: 0021-8979
DOI: 10.1063/1.359413
期刊: JOURNAL OF APPLIED PHYSICS
Volume: 77
Issue: 9
起始頁: 4771
結束頁: 4776
Appears in Collections:Articles