SIMULATION STUDY OF A NEW PHASE-SHIFTING MASK - HALFTONE-RIM

標題:	SIMULATION STUDY OF A NEW PHASE-SHIFTING MASK - HALFTONE-RIM
作者:	LOONG, WA YEH, CH SHY, SL 應用化學系 Department of Applied Chemistry
關鍵字:	PHASE-SHIFTING MASK;HALF-TONE;RIM;HALF-TONE-RIM;SIMULATION;OFF-AXIS ILLUMINATION;SUBMICRON LITHOGRAPHY
公開日期:	1995
URI:	http://hdl.handle.net/11536/19976 http://dx.doi.org/10.1117/12.209275
ISBN:	0-8194-1788-2
DOI:	10.1117/12.209275
期刊:	OPTICAL/LASER MICROLITHOGRAPHY VIII
Volume:	2440
起始頁:	448
結束頁:	457
Appears in Collections:	Conferences Paper

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