SIMULATION STUDY OF A NEW PHASE-SHIFTING MASK - HALFTONE-RIM

Title:	SIMULATION STUDY OF A NEW PHASE-SHIFTING MASK - HALFTONE-RIM
Authors:	LOONG, WA YEH, CH SHY, SL 應用化學系 Department of Applied Chemistry
Keywords:	PHASE-SHIFTING MASK;HALF-TONE;RIM;HALF-TONE-RIM;SIMULATION;OFF-AXIS ILLUMINATION;SUBMICRON LITHOGRAPHY
Issue Date:	1995
URI:	http://hdl.handle.net/11536/19976 http://dx.doi.org/10.1117/12.209275
ISBN:	0-8194-1788-2
DOI:	10.1117/12.209275
Journal:	OPTICAL/LASER MICROLITHOGRAPHY VIII
Volume:	2440
Begin Page:	448
End Page:	457
Appears in Collections:	Conferences Paper

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