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dc.contributor.authorTsai, Yu-Tingen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorHuang, Wei-Lien_US
dc.contributor.authorHuang, Chih-Wenen_US
dc.contributor.authorSyu, Yong-Enen_US
dc.contributor.authorChen, Shih-Chengen_US
dc.contributor.authorSze, Simon M.en_US
dc.contributor.authorTsai, Ming-Jinnen_US
dc.contributor.authorTseng, Tseung-Yuenen_US
dc.date.accessioned2014-12-08T15:27:50Z-
dc.date.available2014-12-08T15:27:50Z-
dc.date.issued2011-08-29en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3629788en_US
dc.identifier.urihttp://hdl.handle.net/11536/20090-
dc.description.abstractDual bipolar resistive switching characteristics were observed in the Pt/DyMn(2)O(5)/TiN memory devices. The typical switching effect could be attributed to the formation and rupture of the conducting filament in DyMn(2)O(5) films. The parasitic switching behavior can be observed in the specific operation condition. Dual bipolar resistance switching behaviors of filament-type and interface-type can coexist in the devices by appropriate voltage operation. The operating current can be significantly decreased (100 times) by parasitic switching operation for portable electronic product application. In addition, the relationship between filament-type and interface-type switching behaviors were studied in this paper. (C) 2011 American Institute of Physics. [doi:10.1063/1.3629788]en_US
dc.language.isoen_USen_US
dc.titleInvestigation for coexistence of dual resistive switching characteristics in DyMn(2)O(5) memory devicesen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.3629788en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume99en_US
dc.citation.issue9en_US
dc.citation.spageen_US
dc.citation.epageen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
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