標題: | REACTIVE ION ETCH OF GAAS AND ALGAAS USING BCL3, SICL4 AND SF6, INSTEAD OF CCL2F2 |
作者: | WU, JW CHANG, CY LIN, KC CHANG, EY HWANG, JH 電控工程研究所 Institute of Electrical and Control Engineering |
公開日期: | 1994 |
URI: | http://hdl.handle.net/11536/20111 |
ISBN: | 1-55899-244-8 |
ISSN: | 0272-9172 |
期刊: | MATERIALS AND PROCESSES FOR ENVIRONMENTAL PROTECTION |
Volume: | 344 |
起始頁: | 295 |
結束頁: | 299 |
Appears in Collections: | Conferences Paper |