標題: | Bipolar conductivity in amorphous HfO(2) |
作者: | Islamov, D. R. Gritsenko, V. A. Cheng, C. H. Chin, A. 交大名義發表 National Chiao Tung University |
公開日期: | 15-Aug-2011 |
摘要: | This study calculates the contribution of electrons and holes to HfO(2) conductivity in Si/HfO(2)/Ni structures using experiments on injection of minority carriers from n- and p-type silicon. Results show that electrons and holes contribute to the conductivity of HfO(2), allowing HfO(2) to exhibit two-band conductivity. (C) 2011 American Institute of Physics. [doi:10.1063/1.3626599] |
URI: | http://dx.doi.org/10.1063/1.3626599 http://hdl.handle.net/11536/20212 |
ISSN: | 0003-6951 |
DOI: | 10.1063/1.3626599 |
期刊: | APPLIED PHYSICS LETTERS |
Volume: | 99 |
Issue: | 7 |
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Appears in Collections: | Articles |