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dc.contributor.authorVasudevan, R. K.en_US
dc.contributor.authorMorozovska, A. N.en_US
dc.contributor.authorEliseev, E. A.en_US
dc.contributor.authorBritson, J.en_US
dc.contributor.authorYang, J. -C.en_US
dc.contributor.authorChu, Y. -H.en_US
dc.contributor.authorMaksymovych, P.en_US
dc.contributor.authorChen, L. Q.en_US
dc.contributor.authorNagarajan, V.en_US
dc.contributor.authorKalinin, S. V.en_US
dc.date.accessioned2014-12-08T15:28:33Z-
dc.date.available2014-12-08T15:28:33Z-
dc.date.issued2012-11-01en_US
dc.identifier.issn1530-6984en_US
dc.identifier.urihttp://dx.doi.org/10.1021/nl302382ken_US
dc.identifier.urihttp://hdl.handle.net/11536/20650-
dc.description.abstractA new paradigm of domain wall. nanoelectronics has emerged recently, in which the domain wall in a ferroic is itself an active device element The ability to spatially. modulate the ferroic order parameter within a single domain wall allows the physical properties to be tailored at will and hence opens vastly unexplored device possibilities: Here, we demonstrate via ambient and ultrahigh-vacuum (UHV) scanning probe microscopy (SPM) measurements in bismuth ferrite that the conductivity of the domain walls can be modulated by up to 500% in the spatial dimension as a function of domain wall curvature. Landau-Ginzburg-Devonshire calculations reveal the conduction is a.. result of carriers or vacancies migrating to neutralize the charge at the farmed interface. Phase field modeling indicates that anisotropic potential distributions can occur even for initially uncharged walls, from polarization dynamics mediated by elastic effects. These results are the first proof of concept for modulation of charge as a function of domain wall geometry by a proximal probe, thereby expanding potential applications for oxide ferroics in future nanoscale electronics.en_US
dc.language.isoen_USen_US
dc.subjectDomain wall conductionen_US
dc.subjectPFMen_US
dc.subjectphase-field modelingen_US
dc.subjectc-AFMen_US
dc.subjectferroelectricsen_US
dc.titleDomain Wall Geometry Controls Conduction in Ferroelectricsen_US
dc.typeArticleen_US
dc.identifier.doi10.1021/nl302382ken_US
dc.identifier.journalNANO LETTERSen_US
dc.citation.volume12en_US
dc.citation.issue11en_US
dc.citation.spage5524en_US
dc.citation.epage5531en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000311244400014-
dc.citation.woscount11-
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