Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Do, Hien | en_US |
dc.contributor.author | Wu, Yue-Han | en_US |
dc.contributor.author | Van-Truong Dai | en_US |
dc.contributor.author | Peng, Chun-Yen | en_US |
dc.contributor.author | Yen, Tzu-Chun | en_US |
dc.contributor.author | Chang, Li | en_US |
dc.date.accessioned | 2014-12-08T15:29:34Z | - |
dc.date.available | 2014-12-08T15:29:34Z | - |
dc.date.issued | 2013-01-15 | en_US |
dc.identifier.issn | 0257-8972 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1016/j.surfcoat.2012.11.008 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/21264 | - |
dc.description.abstract | High-quality epitaxial TiNxOy, films with different oxygen content were deposited on MgO(001) substrates by pulsed laser deposition method. The chemical composition of the deposited films was determined by X-ray photoelectron spectroscopy. X-ray diffraction results showed that the TiNxOy films are heteroepitaxially grown on MgO with good crystallinity and their lattice parameters decrease with increased oxygen concentration. Transmission electron microscopy analyses showed that TiNxOy films contain a low density of dislocations. Atomic force microscopy revealed very smooth surfaces of TiNxOy films with roughness of 026-0.29 nm. The resistivity of TiNxOy, films determined by Hall measurement was about 28-33 mu Omega cm. Nanoindentation measurements showed the film hardness and Young's modulus of about 23-26 GPa and 400-430 GPa, respectively. (C) 2012 Elsevier B.V. All rights reserved. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | Titanium oxynitride | en_US |
dc.subject | Epitaxial growth | en_US |
dc.subject | Pulsed laser deposition | en_US |
dc.subject | Nanoindentation | en_US |
dc.title | Structure and property of epitaxial titanium oxynitride grown on MgO(001) substrate by pulsed laser deposition | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1016/j.surfcoat.2012.11.008 | en_US |
dc.identifier.journal | SURFACE & COATINGS TECHNOLOGY | en_US |
dc.citation.volume | 214 | en_US |
dc.citation.issue | en_US | |
dc.citation.spage | 91 | en_US |
dc.citation.epage | 96 | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000315004000013 | - |
dc.citation.woscount | 3 | - |
Appears in Collections: | Articles |
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