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dc.contributor.authorCheng, C. H.en_US
dc.contributor.authorChin, Alberten_US
dc.date.accessioned2014-12-08T15:29:44Z-
dc.date.available2014-12-08T15:29:44Z-
dc.date.issued2013-04-01en_US
dc.identifier.issn0947-8396en_US
dc.identifier.urihttp://dx.doi.org/10.1007/s00339-013-7547-0en_US
dc.identifier.urihttp://hdl.handle.net/11536/21362-
dc.description.abstractWe report a novel resistive random access memory using tri-layer dielectrics of GeO (x) /nano-crystal TiO2/TaON and low cost top Ni and bottom TaN electrodes. Excellent device performance of ultra-low 720 fJ switching energy, tight distributions of set/reset currents, and exceptionally long endurance of 5x10(9) cycles were achieved simultaneously. Such excellent endurance may create new applications such as those used for Data Centers that are ascribed to the higher-kappa nano-crystal TiO2, hopping pass via grain boundaries, and fast switching speed of 100 ns to improve the dielectric fatigue during endurance stress.en_US
dc.language.isoen_USen_US
dc.titleNano-crystallized titanium oxide resistive memory with uniform switching and long enduranceen_US
dc.typeArticleen_US
dc.identifier.doi10.1007/s00339-013-7547-0en_US
dc.identifier.journalAPPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSINGen_US
dc.citation.volume111en_US
dc.citation.issue1en_US
dc.citation.spage203en_US
dc.citation.epage207en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000316075700025-
dc.citation.woscount1-
Appears in Collections:Articles


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