完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Cheng, C. H. | en_US |
dc.contributor.author | Chin, Albert | en_US |
dc.date.accessioned | 2014-12-08T15:29:44Z | - |
dc.date.available | 2014-12-08T15:29:44Z | - |
dc.date.issued | 2013-04-01 | en_US |
dc.identifier.issn | 0947-8396 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1007/s00339-013-7547-0 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/21362 | - |
dc.description.abstract | We report a novel resistive random access memory using tri-layer dielectrics of GeO (x) /nano-crystal TiO2/TaON and low cost top Ni and bottom TaN electrodes. Excellent device performance of ultra-low 720 fJ switching energy, tight distributions of set/reset currents, and exceptionally long endurance of 5x10(9) cycles were achieved simultaneously. Such excellent endurance may create new applications such as those used for Data Centers that are ascribed to the higher-kappa nano-crystal TiO2, hopping pass via grain boundaries, and fast switching speed of 100 ns to improve the dielectric fatigue during endurance stress. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Nano-crystallized titanium oxide resistive memory with uniform switching and long endurance | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1007/s00339-013-7547-0 | en_US |
dc.identifier.journal | APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | en_US |
dc.citation.volume | 111 | en_US |
dc.citation.issue | 1 | en_US |
dc.citation.spage | 203 | en_US |
dc.citation.epage | 207 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000316075700025 | - |
dc.citation.woscount | 1 | - |
顯示於類別: | 期刊論文 |