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dc.contributor.authorRavipati, Srikanthen_US
dc.contributor.authorShieh, Jiannen_US
dc.contributor.authorKo, Fu-Hsiangen_US
dc.contributor.authorYu, Chen-Chiehen_US
dc.contributor.authorChen, Hsuen-Lien_US
dc.date.accessioned2014-12-08T15:29:45Z-
dc.date.available2014-12-08T15:29:45Z-
dc.date.issued2013-03-25en_US
dc.identifier.issn0935-9648en_US
dc.identifier.urihttp://dx.doi.org/10.1002/adma.201204235en_US
dc.identifier.urihttp://hdl.handle.net/11536/21374-
dc.description.abstractA double-layer nanostructure comprising amorphous Si nanograss on top of Si nanofrustums (NFs) with a total height of 680 nm exhibits ultralow reflection. Almost near-unity absorption and near-zero reflectance result in this layered nanostructure, over a broad range of wavelengths and a wide range of angles of incidence, due to the low packing density of a-Si and the smooth transition of the refractive index from the air to the Si substrate across both the nanograss and NF layers.en_US
dc.language.isoen_USen_US
dc.subjectultralow reflectionen_US
dc.subjectabsorptionen_US
dc.subjectheterostructuresen_US
dc.subjectblack materialsen_US
dc.titleUltralow Reflection from a-Si Nanograss/Si Nanofrustum Double Layersen_US
dc.typeArticleen_US
dc.identifier.doi10.1002/adma.201204235en_US
dc.identifier.journalADVANCED MATERIALSen_US
dc.citation.volume25en_US
dc.citation.issue12en_US
dc.citation.spage1724en_US
dc.citation.epage1728en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000316322600009-
dc.citation.woscount7-
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