Ultralow Reflection from a-Si Nanograss/Si Nanofrustum Double Layers

doi:10.1002/adma.201204235

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	Ravipati, Srikanth	en_US
dc.contributor.author	Shieh, Jiann	en_US
dc.contributor.author	Ko, Fu-Hsiang	en_US
dc.contributor.author	Yu, Chen-Chieh	en_US
dc.contributor.author	Chen, Hsuen-Li	en_US
dc.date.accessioned	2014-12-08T15:29:45Z	-
dc.date.available	2014-12-08T15:29:45Z	-
dc.date.issued	2013-03-25	en_US
dc.identifier.issn	0935-9648	en_US
dc.identifier.uri	http://dx.doi.org/10.1002/adma.201204235	en_US
dc.identifier.uri	http://hdl.handle.net/11536/21374	-
dc.description.abstract	A double-layer nanostructure comprising amorphous Si nanograss on top of Si nanofrustums (NFs) with a total height of 680 nm exhibits ultralow reflection. Almost near-unity absorption and near-zero reflectance result in this layered nanostructure, over a broad range of wavelengths and a wide range of angles of incidence, due to the low packing density of a-Si and the smooth transition of the refractive index from the air to the Si substrate across both the nanograss and NF layers.	en_US
dc.language.iso	en_US	en_US
dc.subject	ultralow reflection	en_US
dc.subject	absorption	en_US
dc.subject	heterostructures	en_US
dc.subject	black materials	en_US
dc.title	Ultralow Reflection from a-Si Nanograss/Si Nanofrustum Double Layers	en_US
dc.type	Article	en_US
dc.identifier.doi	10.1002/adma.201204235	en_US
dc.identifier.journal	ADVANCED MATERIALS	en_US
dc.citation.volume	25	en_US
dc.citation.issue	12	en_US
dc.citation.spage	1724	en_US
dc.citation.epage	1728	en_US
dc.contributor.department	材料科學與工程學系	zh_TW
dc.contributor.department	Department of Materials Science and Engineering	en_US
dc.identifier.wosnumber	WOS:000316322600009	-
dc.citation.woscount	7	-
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