標題: FOWLER-NORDHEIM LIMITED BAND-TO-BAND TUNNELING (FNBB) FOR P-MOSFET GATE CURRENT IN A FLOATING BULK CONDITION
作者: CHAO, KC
CHEN, MJ
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
公開日期: 1-一月-1995
摘要: A new mechanism of Fowler-Nordheim tunneling limited band-to-band tunneling (FNBB) has been identified to be responsible for the gate current measured from p-MOSFETs with the bulk (n-well) floated. This mechanism has been found to occur in the gate-to-drain overlap region. Two-dimensional device simulations have successfully reproduced this gate current and thus the physical parameter values of the band-to-band tunneling model have been obtained.
URI: http://dx.doi.org/10.1016/0038-1101(94)E0049-K
http://hdl.handle.net/11536/2151
ISSN: 0038-1101
DOI: 10.1016/0038-1101(94)E0049-K
期刊: SOLID-STATE ELECTRONICS
Volume: 38
Issue: 1
起始頁: 135
結束頁: 137
顯示於類別:期刊論文


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