| 標題: | FOWLER-NORDHEIM LIMITED BAND-TO-BAND TUNNELING (FNBB) FOR P-MOSFET GATE CURRENT IN A FLOATING BULK CONDITION |
| 作者: | CHAO, KC CHEN, MJ 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
| 公開日期: | 1-Jan-1995 |
| 摘要: | A new mechanism of Fowler-Nordheim tunneling limited band-to-band tunneling (FNBB) has been identified to be responsible for the gate current measured from p-MOSFETs with the bulk (n-well) floated. This mechanism has been found to occur in the gate-to-drain overlap region. Two-dimensional device simulations have successfully reproduced this gate current and thus the physical parameter values of the band-to-band tunneling model have been obtained. |
| URI: | http://dx.doi.org/10.1016/0038-1101(94)E0049-K http://hdl.handle.net/11536/2151 |
| ISSN: | 0038-1101 |
| DOI: | 10.1016/0038-1101(94)E0049-K |
| 期刊: | SOLID-STATE ELECTRONICS |
| Volume: | 38 |
| Issue: | 1 |
| 起始頁: | 135 |
| 結束頁: | 137 |
| Appears in Collections: | Articles |
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